Laser photochemical etching of silica: Nanodomains of crystalline chaoite and silica in amorphous C/Si/O/N phase

Journal of Physical Chemistry C

Volumn 112, Issue 34, 2008, Pages 13281-13286

  Pola, Josef ^a   Ouchi, Akihiko ^b   Bakardjieva, Snejana ^c   Vorlíček, Vladimír ^d   Maryško, Miroslav ^d   Šubrt, Jan ^c   Bastl, Zdeněk ^e  

^a INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

^d INSTITUTE OF PHYSICS   (Czech Republic)

^e J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; CARBON NITRIDE; CRYSTALLINE MATERIALS; ELECTRON SPIN RESONANCE SPECTROSCOPY; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROSCOPIC EXAMINATION; NANOCOMPOSITES; NANOSTRUCTURED MATERIALS; OXIDES; PARAMAGNETIC RESONANCE; PHOTOELECTRON SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

NANO-DOMAINS; NANOREGIONS;

SILICA;

EID: 51749091542     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp803738k     Document Type: Article

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