Comparison of the long time stability of some SiCxOy: H films and related compounds with respect to postdeposition incorporation of OH groups

Fresenius' Journal of Analytical Chemistry

Volumn 346, Issue 1-3, 1993, Pages 351-354

  Bartella, J ^a   Herwig, U ^a  

^a EVONIK INDUSTRIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001066633     PISSN: 09370633     EISSN: 16182650     Source Type: Journal    
DOI: 10.1007/BF00321448     Document Type: Article

References (8)

1. Local bonding environments of Si–OH groups in SiO2 deposited by remote plasma-enhanced chemical vapor deposition and incorporated by postdeposition exposure to water vapor