Effect of band warping and wafer orientation on NMOS mobility under arbitrary applied stress

Journal of Computational Electronics

Volumn 7, Issue 3, 2008, Pages 95-98

  Kotlyar, Roza ^a   Weber, C ^a   Shifren, L ^a   Cea, S ^a   Giles, M D ^a   Stettler, M ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Low field mobility; Stress; Wafer orientation

Indexed keywords

APPLIED STRESSES; LOW FIELD MOBILITY; STRESS; WAFER ORIENTATION;

CARRIER MOBILITY;

EID: 50949086574     PISSN: 15698025     EISSN: 15728137     Source Type: Journal    
DOI: 10.1007/s10825-007-0162-6     Document Type: Article

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