Characterization of laser and laser/thermal annealed semiconducting iron silicide thin films

Journal of Materials Science: Materials in Electronics

Volumn 10, Issue 9, 1999, Pages 627-631

  Datta, A ^a   Kal, S ^a   Basu, S ^a   Nayak, M ^b   Nath, A K ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

^b RAJA RAMANNA CENTRE FOR ADVANCED TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CONTINUOUS WAVE LASERS; HETEROJUNCTIONS; IRON COMPOUNDS; IRRADIATION; LASER DAMAGE; LIGHT REFLECTION; PULSED LASER APPLICATIONS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

LASER-THERMAL ANNEALING; SEMICONDUCTING IRON SILICIDE THIN FILMS;

SEMICONDUCTING FILMS;

EID: 0033340932     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1008908317850     Document Type: Article

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