High throughput screening of piezoelectric response of ferroelectric thin films with automated scanning probe microscopy

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8609-8612

  Herber, Ralf Peter ^a   Schröter, Christian ^b   Wessler, Berit ^c   Schneider, Gerold A ^a  

^a HAMBURG UNIVERSITY OF TECHNOLOGY   (Germany)

^b SIEMENS AG   (Germany)

^c OSRAM OPTO SEMICONDUCTORS GMBH   (Germany)

Author keywords

Atomic force microscopy (AFM); Ceramics; Ferroelectric properties; Piezoelectric effect

Indexed keywords

COLLOIDS; FERROELECTRIC FILMS; FERROELECTRIC THIN FILMS; FERROELECTRICITY; GELATION; IMAGING TECHNIQUES; MICROSCOPIC EXAMINATION; PIEZOELECTRICITY; SOL-GEL PROCESS; THICK FILMS; THIN FILMS; THROUGHPUT; VAPOR DEPOSITION;

ATOMIC FORCE MICROSCOPY (AFM); AUTOMATED SCANNING; AUTOMATIC MEASUREMENTS; CERAMICS; CHEMICAL COMPOSITIONS; FERROELECTRIC PROPERTIES; FIGURES OF MERIT; HIGH THROUGHPUT SCREENING; HIGH-THROUGHPUT EXPERIMENTATION; PIEZOELECTRIC COEFFICIENTS; PIEZOELECTRIC EFFECT; PIEZOELECTRIC RESPONSES; PIEZORESPONSE; PIEZORESPONSE FORCE MICROSCOPY; SOL-GEL ROUTES;

ELECTRON BEAM LITHOGRAPHY;

CERAMICS; COLLOIDS; DEPOSITION; ELECTRON BEAMS; GELATION; LITHOGRAPHY; THIN FILMS; THROUGHPUT; VAPORS;

EID: 50849133885     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.06.036     Document Type: Article

References (22)

1. Haertling G.H. J. Am. Ceram. Soc. 82 (1999) 797
2. Ishiwara H., Okuyama M., and Arimoto Y. Ferroelectric Random Access Memories: Fundamentals and Applications vol. 93 (2004), Springer-Verlag, Berlin
3. Setter N., Damjanovic D., Eng L., Fox G., Gevorgian S., Hong S., Kingon A., Kohlstedt H., Park N.Y., Stevenson G.B., Stolitchnov I., Taganstev A.K., Taylor D.V., Yamada T., and Streiffer S. J. Appl. Phys. 100 (2006) 051606
4. Franke K., Besold J., Haessler W., and Seegebarth C. Surf. Sci. 302 1-2 (1994) L283
5. Schroeter C., Wessler B., Schoenecker A., and Keitel U. J. Appl. Phys. 100 (2006) 114114
6. Abplanalp M., Eng L.M., and Günter P. Appl. Phys., A 66 (1998) 231
7. Eng L.M., Güntherodt H.-J., Schneider G.A., Köpke U., and Munoz-Saldana J. Appl. Phys. Lett. 74 (1999) 233
8. Munoz-Saldana J., Hoffmann M.J., and Schneider G.A. J. Mater. Res. 18 (2003) 1777
9. Herber R.P., Schneider G.A., Wagner S., and Hoffmann M.J. Appl. Phys. Lett. 90 (2007) 252905
10. Gruverman A., Auciello O., Ramesh R., and Tokumoto H. Nanotechnology 8 (1997) A38
11. Guthner P., and Dransfeld K. Appl. Phys. Lett. 61 (1992) 1137
12. Felten F., Schneider G.A., Munoz Saldana J., and Kalinin S.V. J. Appl. Phys. 96 (2004) 563
13. Jaffe B., Cook Jr. W.R., and Jaffe H. Piezoelectric Ceramics (1971), Academic Press, London 136
14. Peter F., Rüdiger A., Waser R., and Szot K. Rev. Sci. Instrum. 76 (2005) 046101
15. Kalinin S.V., and Bonnell D.A. J. Mater. Res. 17 (2002) 936
16. Kalinin S.V., and Bonnel D.A. Phys. Rev., B 65 (2002) 125408
17. Giannakopoulos A.E., and Suresh S. Acta Mater. 47 (1999) 2153
18. Kalinin S.V., Rodriguez B.R., Jesse S., Karapetian E., Mirman B., Eliseev E.A., and Morozovska A.N. Annu. Rev. Mater. Res. 37 (2007) 189
19. Kalinin S.V., Eliseev E.A., and Morozovska A.N. Appl. Phys. Lett. 88 (2006) 232904
20. Hoffmann A., Jungk T., and Soergel E. Rev. Sci. Instrum. 78 (2007) 016101
21. Freund J., Halbritter J., and Hörber J.K.H. Microsc. Res. Tech. 44 (1999) 327
22. Jungk T., Hoffmann A., and Soergel E. Appl. Phys. Lett. 89 (2006) 163507