High throughput screening of ferroelectric thin film libraries

Journal of Applied Physics

Volumn 100, Issue 11, 2006, Pages

  Schroeter, Christian ^a,b   Wessler, Berit ^a   Schoenecker, Andreas ^c   Keitel, Uwe ^c   Eng, Lukas M ^b  

^a SIEMENS AG   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^c FRAUNHOFER INSTITUTE FOR CERAMIC TECHNOLOGIES AND SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; FERROELECTRIC MATERIALS; FILM GROWTH; PERMITTIVITY; SYNTHESIS (CHEMICAL); ZIRCONIUM COMPOUNDS;

FERROELECTRIC HYSTERISIS; FILM THICKNESS; LEAD ZIRCONATE TITANATE;

THIN FILMS;

EID: 33845768447     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2357424     Document Type: Article

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