High reflectivity multilayer for He-II radiation at 30.4 nm

Applied Optics

Volumn 47, Issue 13, 2008, Pages

  Zhu, Jingtao ^a   Wang, Zhanshan ^a   Zhang, Zhong ^a   Wang, Fengli ^a   Wang, Hongchang ^a   Wu, Wenjuan ^a   Zhang, Shumin ^a   Xu, Da ^a   Chen, Lingyan ^a   Zhou, Hongjun ^b   Huo, Tonglin ^b   Cui, Mingqi ^c   Zhao, Yidong ^c  

^a TONGJI UNIVERSITY   (China)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^c INSTITUTE OF HIGH ENERGY PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EMISSION SPECTROSCOPY; REFLECTION; SILICON CARBIDE; SYNCHROTRON RADIATION; THERMODYNAMIC STABILITY;

ANNEALING EXPERIMENTS; DIRECT CURRENT MAGNETRON SPUTTERING; DUAL FUNCTION; HIGH REFLECTIVITY; INCIDENT ANGLES; MULTI-LAYER MIRRORS; NATIONAL SYNCHROTRON RADIATION LABORATORY; X-RAY EMISSION SPECTRA;

MULTILAYERS;

EID: 50849121103     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.00C310     Document Type: Article

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