Preparation and characterization of nanocrystalline tin oxide thin films deposited at room temperature

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8587-8593

  Deshpande, Nishad G ^a   Vyas, Jagdish C ^b   Sharma, Ramphal ^a  

^a DR BABASAHEB AMBEDKAR MARATHWADA UNIVERSITY   (India)

^b BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

Atomic force microscopy (AFM); M SILAR; Nanostructures; Photoluminescence; Tin oxide; X ray diffraction

Indexed keywords

FILM PREPARATION; OXIDE FILMS; THICK FILMS; TIN; TITANIUM COMPOUNDS;

ATOMIC FORCE MICROSCOPY (AFM); M-SILAR; NANOCRYSTALLINE TIN; NANOSTRUCTURES; PHOTOLUMINESCENCE; ROOM TEMPERATURES; TIN OXIDE; X-RAY DIFFRACTION;

NANOCRYSTALLINE ALLOYS;

EID: 50849116745     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.06.016     Document Type: Article

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