Ultra shallow junctions fabrication by Plasma Immersion Implantation on PULSION® followed by different annealing processes

IWJT-2008 - Extended Abstracts 2008 International Workshop on Junction Technology

Volumn , Issue , 2008, Pages 32-38

  Etienne, H ^a   Vervisch, V ^a,b   Torregrosa, F ^a   Sarnet, T ^c   Delaporte, P ^c   Cristiano, F ^d   Fazzini, P F ^d   Roux, L ^a   Sempere, G ^a  

^a Ion Beam Services   (France)

^b AIX MARSEILLE UNIVERSITY   (France)

^c AIX MARSEILLE UNIVERSITY   (France)

^d UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER NETWORKS; ION BOMBARDMENT; ION IMPLANTATION; PLASMA APPLICATIONS; SILICON;

ANNEALING PROCESSING; PLASMA IMMERSION ION IMPLANTATION; ULTRA-SHALLOW JUNCTIONS;

PLASMAS;

EID: 50849096107     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IWJT.2008.4540012     Document Type: Conference Paper

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