Transparent thin-film transistors with zinc oxide semiconductor fabricated by reactive sputtering using metallic zinc target

Thin Solid Films

Volumn 516, Issue 22, 2008, Pages 8159-8164

  Cheong, Woo Seok ^a   Ryu, Min Ki ^a   Shin, Jae heon ^a   Park, Sang Hee Ko ^a   Hwang, Chi Sun ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Reactive sputtering; Sputtering; Thin film transistor; Transparent electronics; ZnO

Indexed keywords

METALLIC COMPOUNDS; NONMETALS; OPTICAL DESIGN; OXIDE FILMS; OXIDES; OXYGEN; REACTIVE SPUTTERING; SEMICONDUCTING ORGANIC COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR MATERIALS; THIN FILM DEVICES; THIN FILM TRANSISTORS; TRANSISTORS; ZINC; ZINC OXIDE; ZINC PLATING;

ACTIVE CHANNELS; OXIDE SEMICONDUCTORS; RF-MAGNETRON SPUTTERING; SPUTTERING; THIN-FILM TRANSISTOR; TRANSPARENT ELECTRONICS; TRANSPARENT THIN-FILM TRANSISTORS; ZNO;

MAGNETRON SPUTTERING;

EID: 50649101694     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.04.063     Document Type: Article

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