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Volumn 109, Issue 1-3, 2004, Pages 241-244
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Electrical and optical properties of zinc oxide thin films grown by reactive magnetron sputtering method
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Author keywords
Reactive magnetron sputtering; ZnO thin films
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Indexed keywords
ANNEALING;
CHEMICAL VAPOR DEPOSITION;
ELECTRIC RESISTANCE;
FILM GROWTH;
HETEROJUNCTIONS;
ION BEAM ASSISTED DEPOSITION;
LEAKAGE CURRENTS;
MAGNETRON SPUTTERING;
OXIDATION;
PULSED LASER DEPOSITION;
SURFACE TREATMENT;
X RAY DIFFRACTION ANALYSIS;
ZINC OXIDE;
FLOW RATES;
REACTIVE MAGNETRON SPUTTERING;
ZINC OXIDE (ZNO);
ZNO THIN FILMS;
THIN FILMS;
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EID: 2342523356
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mseb.2003.10.072 Document Type: Conference Paper |
Times cited : (11)
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References (7)
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