Chemical vapor deposition of SiO2 films by TEOS/O2 supermagnetron plasma

Vacuum

Volumn 76, Issue 1, 2004, Pages 19-22

  Kinoshita, Haruhisa ^a   Murakami, Toichi ^a   Fukushima, Fumihiko ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Air gap; Chemical vapor deposition; Plasma processing; Silicon oxide; Supermagnetron plasma

Indexed keywords

AIR; ASPECT RATIO; CHEMICAL BONDS; DIELECTRIC DEVICES; ETCHING; MAGNETRONS; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; QUARTZ; SUBSTRATES; THIN FILMS; ULSI CIRCUITS;

AIR GAP; PLASMA PROCESSING; SUPERMAGNETRON PLASMA; TEOS/O2;

SILICA;

EID: 5044250855     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.05.006     Document Type: Article

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