High-resolution resist etching for quartermicron lithography using O2/N2 supermagnetron plasma

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 1, 1999, Pages 109-112

  Yamauchi, Atsushi ^a   Sawai, Mikio ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; ELECTRODES; EXCIMER LASERS; MAGNETRONS; NITROGEN; OXYGEN; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

MICROLOADING EFFECT; QUARTERMICRON LITHOGRAPHY; SUPERMAGNETRON PLASMA ETCHING;

PLASMA ETCHING;

EID: 0032621041     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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