Oxidation of high area ratio silicon microchannels fabricated by electrochemical etching

3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS

Volumn , Issue , 2008, Pages 78-81

  Chen, Xiaoming ^a   Lin, Jilei ^a   Xu, Shaohui ^a   Xin, Peisheng ^a   Wang, Lianwei ^a,b  

^a EAST CHINA NORMAL UNIVERSITY   (China)

^b STATE KEY LABORATORY OF TRANSDUCER TECHNOLOGY   (China)

Author keywords

HF concentration; High aspect ratio; Microchannel; Oxidation

Indexed keywords

CHEMICAL OXYGEN DEMAND; COMPUTATIONAL METHODS; COMPUTER SIMULATION; ELECTROCHEMICAL ETCHING; ETCHING; NONMETALS; OPTICAL DESIGN; OXIDATION; SILICON;

APPLICATIONS.; AREA RATIOS; HF CONCENTRATION; HIGH ASPECT RATIO; HIGH TEMPERATURE; INTERNATIONAL CONFERENCES; LIGHT DETECTION; MICROCHANNEL; MOLECULAR SYSTEMS; NIGHT VISION; OXIDATION PROCESSES; OXIDATION TIME; SILICON MICROCHANNELS;

MICROCHANNELS;

EID: 50349100598     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NEMS.2008.4484290     Document Type: Conference Paper

References (9)

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