Silicon-micromachined microchannel plates

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 442, Issue 1, 2000, Pages 443-451

  Beetz, Charles P ^a   Boerstler, Robert ^a   Steinbeck, John ^a   Lemieux, Bryan ^b   Winn, David R ^b  

^a NanoSciences Corporation   (United States)

^b FAIRFIELD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ASPECT RATIO; BRAZING; DEPOSITION; MICROMACHINING; PHOTOCATHODES; PHOTOLITHOGRAPHY; QUARTZ; SECONDARY EMISSION; SILICON WAFERS; THERMAL EFFECTS; THIN FILMS;

HIGH TEMPERATURE BRAZING; INTERSTITIAL DEFECTS; PHOTOLITHOGRAPHIC PROCESS; SILICON MICROMACHINED MICROCHANNEL PLATES; STRIP RESISTANCE;

PLATE METAL;

EID: 0033884898     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-9002(99)01271-1     Document Type: Article

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