Oxidation of silicon electrochemically etched microchannels arrays

Proceedings of 1st IEEE International Conference on Nano Micro Engineered and Molecular Systems, 1st IEEE-NEMS

Volumn , Issue , 2006, Pages 399-402

  Wu, Junxu ^b   Wang, Lianwei ^a,b,c   Chen, Xiaoming ^b   Zheng, Mingjie ^d   Liu, Weili ^d   Song, Zhitang ^d   Sarro, P M ^a,e  

^a IEEE

^b EAST CHINA NORMAL UNIVERSITY   (China)

^c STATE KEY LABORATORY OF TRANSDUCER TECHNOLOGY   (China)

^d SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^e DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Macroporous silicon; Microchannel; Oxidation

Indexed keywords

ASPECT RATIO; CHEMICAL OXYGEN DEMAND; DIMENSIONAL STABILITY; EMULSIFICATION; MOLECULES; NEMS; OXIDATION; PASSIVATION; PHOTORESISTS; POROUS SILICON; SILICON;

(1 1 0) SURFACE; (100) SILICON; CHANNEL SIZES; DRY AND WET; ELECTRICAL ISOLATION; HIGH ASPECT RATIO (HAR); INSULATOR LAYERS; INTERNATIONAL CONFERENCES; MACRO POROUS SILICON; MACRO-PORES; MICRO CHANNELS; MOLECULAR SYSTEMS; OXIDATION PROCESSES; OXIDE LAYERS;

MICROCHANNELS;

EID: 46149113471     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NEMS.2006.334767     Document Type: Conference Paper

References (5)

1. H. Ohji, "Macroporous Si based micromachining", Ph.D. thesis, 2002, Delft, The Netherlands, ISBN 90-5166-90.
2. L. Wang, et al "High Aspect Ratio through-Wafer Interconnections for 3D-Microsystems" Proc. 16th IEEE International MEMS conference, January 19-23, 2003, Kyoto, Japan, pp. 634-637.
3. H. Föll et al, Materials Science and Engineering R 39 (2002) 93-141
4. Y.Chen. L.W. Wang and P.M. Sarro, "Highly controllable electrochemical etching process on silicon" Proc. 18th IEEE International MEMS Conference, Jan. 30-Feb. 3, 2005 Miami, USA, pp 512-515
5. A. Rodriguez et al, "Fabrication of silicon oxide microneedles from macroporous silicon", Sensors and Actuators B 109 (2005) 135-134.