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Volumn , Issue , 2007, Pages 621-624

High mobility III-V MOSFETs for RF and digital applications

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DEVICES;

EID: 50249172840     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.2007.4419016     Document Type: Conference Paper
Times cited : (96)

References (15)
  • 1
    • 50249137091 scopus 로고    scopus 로고
    • Online, Available
    • International Technology Roadmap Semiconductors. (2006). [Online]. Available: http://www.itrs.net/Links/2006Update/2006UpdateFinal.htm
    • (2006)
  • 2
    • 0032180717 scopus 로고    scopus 로고
    • Optical measurement system for characterizing compound semiconductor interface and surface states
    • M. Passlack, R.N. Legge, D. Convey, Z. Yu, and J.K. Abrokwah, "Optical measurement system for characterizing compound semiconductor interface and surface states," IEEE Trans. Instrum. Meas., vol. 47, no. 5, pp. 1362-1366, 1998.
    • (1998) IEEE Trans. Instrum. Meas , vol.47 , Issue.5 , pp. 1362-1366
    • Passlack, M.1    Legge, R.N.2    Convey, D.3    Yu, Z.4    Abrokwah, J.K.5
  • 3
    • 50249146233 scopus 로고    scopus 로고
    • Method of forming a dielectric layer structure,
    • US Patent 5,665,658, issued 09/09/97
    • M. Passlack, "Method of forming a dielectric layer structure," US Patent 5,665,658, issued 09/09/97.
    • Passlack, M.1
  • 4
    • 50249175555 scopus 로고    scopus 로고
    • Insulator-compound semiconductor interface structure
    • US Patent 6,359,294, issued 03/19/02
    • M. Passlack, J. Wang, J. Abrokwah, and Z. Yu, "Insulator-compound semiconductor interface structure" US Patent 6,359,294, issued 03/19/02.
    • Passlack, M.1    Wang, J.2    Abrokwah, J.3    Yu, Z.4
  • 5
    • 27144542816 scopus 로고    scopus 로고
    • Methodology for Development of High-κ Stacked Gate Dielectrics on III-V Semiconductors
    • edited by A.A. Demkov and A. Navrotsky, Springer Verlag
    • M. Passlack, "Methodology for Development of High-κ Stacked Gate Dielectrics on III-V Semiconductors," in Materials Fundamentals of Gate Dielectrics," edited by A.A. Demkov and A. Navrotsky, Springer Verlag, 2005, pp. 403-467.
    • (2005) Materials Fundamentals of Gate Dielectrics , pp. 403-467
    • Passlack, M.1
  • 6
    • 33750601101 scopus 로고    scopus 로고
    • Enhancement mode metal-oxide-semiconductor field effect transistor,
    • US Patent 6,963,090, issued 11/08/05
    • M. Passlack, O. Hartin, M. Ray, N. Medendorp, "Enhancement mode metal-oxide-semiconductor field effect transistor," US Patent 6,963,090, issued 11/08/05.
    • Passlack, M.1    Hartin, O.2    Ray, M.3    Medendorp, N.4
  • 7
    • 33750587582 scopus 로고    scopus 로고
    • Implant-Free, High Mobility Flatband MOSFET: Principles of Operation
    • M. Passlack, K. Rajagopalan, J. Abrokwah, and Droopad, "Implant-Free, High Mobility Flatband MOSFET: Principles of Operation," IEEE Trans. Electron. Dev., vol. ED-53, 10, pp. 2454-2459, 2006.
    • (2006) IEEE Trans. Electron. Dev , vol.ED-53 , Issue.10 , pp. 2454-2459
    • Passlack, M.1    Rajagopalan, K.2    Abrokwah, J.3    Droopad4
  • 11
    • 23744498571 scopus 로고    scopus 로고
    • M. Tametou, M. Takebe, K. Nakamura, N.C. Paul, K. Iiyama, and S. Takamiya, Improved Transconductance N-Channel Enhancement/Inversion Mode GaAs-MISFETs with Gate Insulating Layers Formed by Dry Oxi-Nitridation, Proc. 2004 International Conference Indium Phosphide and Related Materials, pp. 187-190.
    • M. Tametou, M. Takebe, K. Nakamura, N.C. Paul, K. Iiyama, and S. Takamiya, "Improved Transconductance N-Channel Enhancement/Inversion Mode GaAs-MISFETs with Gate Insulating Layers Formed by Dry Oxi-Nitridation," Proc. 2004 International Conference Indium Phosphide and Related Materials, pp. 187-190.
  • 13
    • 0742321656 scopus 로고    scopus 로고
    • W. Zhu W, J.-P. Han, and T.P. Ma, Mobility measurement and degradation mechanism of MOSFETs made with ultrathin high-κ dielectrics, IEEE Trans. Electron Devices, 51, no. 1, pp. 98-105, 2004.
    • W. Zhu W, J.-P. Han, and T.P. Ma, "Mobility measurement and degradation mechanism of MOSFETs made with ultrathin high-κ dielectrics," IEEE Trans. Electron Devices, vol. 51, no. 1, pp. 98-105, 2004.
  • 14
    • 33846666180 scopus 로고    scopus 로고
    • 0.7As nano-MOSFETs for low-power CMOS applications
    • 0.7As nano-MOSFETs for low-power CMOS applications," IEEE Trans. Nanotechnol. vol. 6, no. 1, pp. 106-112, 2007.
    • (2007) IEEE Trans. Nanotechnol , vol.6 , Issue.1 , pp. 106-112
    • Kalna, K.1
  • 15
    • 41149171855 scopus 로고    scopus 로고
    • Tri-Gate Transistor Architecture with High-k Gate Dielectrics, Metal Gates and Strain Engineering
    • J. Kavalieros et al., "Tri-Gate Transistor Architecture with High-k Gate Dielectrics, Metal Gates and Strain Engineering," 2006 Symp VLSI. Technol. Tech Dig., pp. 62-63, 2006.
    • (2006) 2006 Symp VLSI. Technol. Tech Dig , pp. 62-63
    • Kavalieros, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.