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Volumn , Issue , 2006, Pages 283-286

Long-range displacement mini-sensor with submicrometric resolution

Author keywords

[No Author keywords available]

Indexed keywords

DENTISTRY; LAWS AND LEGISLATION; NONMETALS; OPTICAL DESIGN; SILICON;

EID: 50149121399     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSENS.2007.355775     Document Type: Conference Paper
Times cited : (3)

References (15)
  • 1
    • 0032319155 scopus 로고    scopus 로고
    • Optical micro encoder with sub-micro resolution using a VCSEL
    • H. Miyajima, E. Yamamoto, K. Yanagisawa, "Optical micro encoder with sub-micro resolution using a VCSEL", Sensors and Actuators A, Vol. 71, pp 213-218, 1998.
    • (1998) Sensors and Actuators A , vol.71 , pp. 213-218
    • Miyajima, H.1    Yamamoto, E.2    Yanagisawa, K.3
  • 5
    • 0023330847 scopus 로고
    • Photoelectronic displacement sensor with nanometre resolution
    • N. Ikawa, S. Shimada and H. Morooka, " Photoelectronic displacement sensor with nanometre resolution", Precision Engineering, Vol.9, no2, 1987, pp. 79-82.
    • (1987) Precision Engineering , vol.9 , Issue.NO2 , pp. 79-82
    • Ikawa, N.1    Shimada, S.2    Morooka, H.3
  • 6
    • 32944470596 scopus 로고    scopus 로고
    • Reflective optical sensor for long range and high-resolution displacements
    • Prelle C, Lamarque F, Revel. Ph, «Reflective optical sensor for long range and high-resolution displacements», Sensors and Actuators A, Volume 127, Issue 1, pp 139-146, 2006
    • (2006) Sensors and Actuators A , vol.127 , Issue.1 , pp. 139-146
    • Prelle, C.1    Lamarque, F.2    Revel, P.3
  • 7
    • 0008442009 scopus 로고
    • Fibre optic displacement measuring apparatus,
    • US Patent 3,940,608
    • C. Kissinger, Fibre optic displacement measuring apparatus, US Patent 3,940,608 (1967)
    • (1967)
    • Kissinger, C.1
  • 8
    • 0012022356 scopus 로고    scopus 로고
    • An overview and a Contribution to the optical measurement of linear displacement
    • P. M. B. S. Girão, O. A. Postolache, J. A. B. Faria, J. M. C. D. Pereira, An overview and a Contribution to the optical measurement of linear displacement, IEEE sensors journal, Vol. 1, n°4, pp322-331, 2001
    • (2001) IEEE sensors journal , vol.1 , Issue.N4 , pp. 322-331
    • Girão, P.M.B.S.1    Postolache, O.A.2    Faria, J.A.B.3    Pereira, J.M.C.D.4
  • 10
    • 0000016685 scopus 로고    scopus 로고
    • Fabrication and testing of chemically micromachined silicon echelle gratings
    • L. D. Keller, D. T. Jaffe, O. A. Ershov, T. Benedict, U. U. Graf: Fabrication and testing of chemically micromachined silicon echelle gratings. Applied Optics, Vol. 39, No. 7, p. 1094-1104, 2000
    • (2000) Applied Optics , vol.39 , Issue.7 , pp. 1094-1104
    • Keller, L.D.1    Jaffe, D.T.2    Ershov, O.A.3    Benedict, T.4    Graf, U.U.5
  • 11
    • 84876645723 scopus 로고    scopus 로고
    • Silicon Gratings with Different Profiles: Trapezoidal, Triangular, Rectangular, Arched. Center for Microtechnologies (ZfM), Technical University Chemnitz
    • J. Frühauf, S. Krönert: Silicon Gratings with Different Profiles: Trapezoidal, Triangular, Rectangular, Arched. Center for Microtechnologies (ZfM), Technical University Chemnitz, ZfM Annual Report 2003, p. 69-71, 2003
    • (2003) ZfM Annual Report 2003 , pp. 69-71
    • Frühauf, J.1    Krönert, S.2
  • 12
  • 14
    • 0034273342 scopus 로고    scopus 로고
    • Morphological tudy of {311} crystal planes anisotropically etched in (100) silicon: Role of etchants and etching parameters
    • D. Resnik, D. Vrtacnik, S. Amon: Morphological tudy of {311} crystal planes anisotropically etched in (100) silicon: role of etchants and etching parameters. J. Micromech. Microeng. 10 (2000) 430-439
    • (2000) J. Micromech. Microeng , vol.10 , pp. 430-439
    • Resnik, D.1    Vrtacnik, D.2    Amon, S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.