High-Q and CMOS compatible single crystal silicon cantilever with separated on-chip piezoelectric actuator for ultra-sensitive mass detection

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2008, Pages 665-668

  Lu, J ^a   Ikehara, T ^a   Zhang, Y ^a   Mihara, T ^b   Itoh, T ^a   Maeda, R ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b OLYMPUS CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; CANTILEVER BEAMS; COMPOSITE MICROMECHANICS; ENERGY DISSIPATION; MECHANICAL ENGINEERING; MECHANICS; MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES; NATURAL FREQUENCIES; NETWORKS (CIRCUITS); NONMETALS; PIEZOELECTRIC ACTUATORS; PIEZOELECTRIC DEVICES; PIEZOELECTRIC MATERIALS; PIEZOELECTRIC TRANSDUCERS; PIEZOELECTRICITY; POWDERS; Q FACTOR MEASUREMENT; REACTIVE ION ETCHING; SEMICONDUCTING LEAD COMPOUNDS; SENSORS; SILICON; SILICON WAFERS; SINGLE CRYSTALS;

CMOS-COMPATIBLE; FEMTOGRAM; IMPEDENCE MATCHING; INTERNATIONAL CONFERENCES; INTRINSIC ENERGY; MICRO CANTILEVERS; MICRO-ELECTRO MECHANICAL SYSTEMS; NETWORKED SENSORS; ON CHIPS; PARALLEL SENSOR; PIEZORESISTIVE; POTENTIAL APPLICATIONS; PZT ACTUATORS; PZT FILMS; Q FACTORS; RESONANT FREQUENCIES; RESONANT STRUCTURES; SENSITIVE MASS; SINGLE-CRYSTAL-SILICON; WHEATSTONE;

PHOTORESISTS;

EID: 50149105462     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2008.4443744     Document Type: Conference Paper

References (15)

1. T.P.Burg, A.R.Mirza, N.Milovic, C.H.Tsau, G.A.Popescu, J.S.Foster, S.R.Manalis, "Vacuum -packaged suspended microchannel resonant mass sensor for biomolecular detection", J. Microelectromech. Syst., vol.15, pp. 1466-1476, 2006.
2. nd torsion-mode for fg-level resoluble biomedical detection", in Proc. IEEE MEMS'07, Kobe, Japan, Jan.21-25, 2007, pp.107-110.
3. M.Su, S.Li, V.P.Dravid, "Microcantilever resonance-based DNA detection with nanoparticle probes", Appl.Phys.Lett., vol.82, pp.3562-3564, 2003.
4. Z.Hao, S.pourkamali, F.Ayazi, "VHF single-crystal silicon elliptic bulk-mode capacitive disk resonators - part I: design and modeling", J. Microelectromech. Syst., vol.13, pp.1043-1053, 2004.
5. D.L.DeVoe, "Piezoelectric thin film micromechanical beam resonators", Sens. Actuators A, vol.88, pp.263-272, 2001.
6. L.Ye, J.Wu, W.C.Tang, "A 1.14GHz piezoelectrically transduced disk resonator", in Proc. IEEE MEMS'05, Miami, Florida, Jan.30-Feb.3, 2005, pp.203-206.
7. J.Lu, T.Ikehara, Y.Zhang, R.Maeda, T.Mihara, "Energy dissipation mechanisms in lead zirconate titanate thin film transduced micro cantilevers", Jpn.J.Appl.Phys., vol.45, pp.8795-8800, 2006.
8. J.Lu, T.Ikehara, T.Kobayashi, R.Maeda, T.Mihara, "Quality Factor of Micro Cantilevers Transduced by Piezoelectric Lead Zirconate Titanate Film", Microsys. Technol., vol.13, pp.1517-1522, 2007.
9. http://www.memsnet.org/material/
10. F.R.Blom, S.Bouwstra, M.Elwenspoek, J.H.J.Fluitman, "Dependence of the quality factor of micromachined silicon beam resonators on pressure and geometry," J. Vac. Sci. Technol. B, vol.10, pp.19-26, 1992.
11. J.Lu, T.Kobayashi, Y.Zhang, R.Maeda, T.Mihara, "Wafer Scale Lead Zirconate Titanate Film Preparation by Sol-Gel Method Using Stress Balance Layer", Thin Solid Films, vol.515, pp.1506-1510, 2006.
12. rd Japan Sensor Symp., Takamatsu, Japan, Oct.5-6, 2006, pp.304-307.
13. Z.Hao, A.Erbil, F.Ayazi, "An analytical model for support loss in micromachined beam resonators with in-plane flexural vibrations", Sens. Actuators A, vol.109, pp.156-164, 2003.
14. R.Liffshitz, M.L.Roukes, "Thermoelastic damping in micro- and nanomechanical systems", Phys. Rev. B, vol.61, pp.5600-5609, 2000.
15. L.Sekaric, D.W.Carr, S.Evoy, J.M.Parpia, H.G.Craighead, "Nanomechanical resonant structures in silicon nitride: fabrication, operation and dissipation issues", Sens. Actuators A, vol.101, pp.215-219, 2002.