Design and fabrication of non-silicon-based piezoresistive MEMS tactile sensor

Proceedings of IEEE Sensors

Volumn , Issue , 2006, Pages 1317-1320

  Wisitsoraat, A ^a   Patanasetagul, V ^a   Tuantranont, A ^a   Poonnikorn, N ^b  

^a NATIONAL ELECTRONICS AND COMPUTER TECHNOLOGY CENTER   (Thailand)

^b KING MONGKUT'S UNIVERSITY OF TECHNOLOGY THONBURI   (Thailand)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHROMIUM; COMPOSITE MICROMECHANICS; CONDUCTIVE FILMS; COPPER PLATING; DETECTORS; ELECTROPLATING; FINITE ELEMENT METHOD; FLEXIBLE STRUCTURES; GAGES; GOLD; MEMS; MICROELECTROMECHANICAL DEVICES; NICKEL; NONMETALS; OPTICAL DESIGN; OPTICAL SENSORS; OXYGEN; PHOTORESISTS; SILICON; TIN; TITANIUM COMPOUNDS;

ELECTROPLATED NI; FILM-THICKNESS; FINITE ELEMENT SIMULATIONS; FORCE SENSING; GAUGE FACTORS; GLASS SUBSTRATES; HIGH SENSITIVITIES; INDIUM-TIN OXIDE; ITO FILMS; LOW-COST FABRICATION; MEMBRANE STRUCTURING; NON-SILICON; OXYGEN FLOW; OXYGEN FLOW RATE; PIEZORESISTIVE; SACRIFICIAL LAYERS; SHADOW MASKING; TACTILE SENSORS; THICK PHOTORESISTS;

SENSORS;

EID: 50149099982     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSENS.2007.355872     Document Type: Conference Paper

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