Automated dynamic mode multidirectional UV lithography for complex 3-D microstructures

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2008, Pages 399-402

  Kim, Jungkwun ^a   Allen, Mark G ^b   Yoon, Yong Kyu ^a  

^a UNIVERSITY AT BUFFALO   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Automated UV exposure; Inclined exposure; Multidirectional UV lithography; Rotational exposure; Screwed wind vane

Indexed keywords

CHLORINE COMPOUNDS; COMPOSITE MICROMECHANICS; LITHOGRAPHY; MECHANICAL ENGINEERING; MECHANICS; MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; MOTORS; OPTICAL DESIGN; PHOTORESISTS; RAY TRACING; REACTIVE ION ETCHING;

AUTOMATED UV EXPOSURE; COMPUTER CONTROLLED; DYNAMIC MODES; DYNAMIC OPERATIONS; FABRICATED STRUCTURES; INCLINED EXPOSURE; INTERNATIONAL CONFERENCES; MATHEMATICAL EQUATIONS; MICRO-CONTROLLER; MICRO-ELECTRO MECHANICAL SYSTEMS; MULTI-DIRECTIONAL; MULTIDIRECTIONAL UV LITHOGRAPHY; RAY-TRACING SIMULATIONS; ROTATIONAL EXPOSURE; SCREWED WIND VANE; UV EXPOSURE; UV-LITHOGRAPHY; WIND VANE;

THREE DIMENSIONAL;

EID: 50149094694     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2008.4443677     Document Type: Conference Paper

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