Proximity mode inclined uv lithography

Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop

Volumn , Issue , 2006, Pages 98-99

  Yoon, Yong Kyu ^a   Allen, Mark G ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; DEGREES OF FREEDOM (MECHANICS); MASKS; MICROSYSTEMS; NOZZLES; PHOTOMASKS; PHOTORESISTS;

DEGREE OF FREEDOM; INCIDENT ANGLES; INCLINED EXPOSURE; INCLINED UV LITHOGRAPHY; PHOTORESIST LAYERS; THREE-DIMENSIONAL MICROSTRUCTURES; TRANSPARENT GLASS; WALL THICKNESS;

SOLID-STATE SENSORS;

EID: 50149103748     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. C.G. Wilson, “Organic Resist Materials,” in Introduction to Microlithography, L.F. Thompson, C.G. Wilson, and M.J. Bowden, Eds. Washington D.C.; American Chemical Society, 1994.
2. W. Henke, M. Weiss, R. Schwalm, and J. Pelka, “Simulation of proximity printing,” Microelectron. Eng. vol. 10, pp 127-52, 1990.
3. W. Henke, M. Weiss, R. Schwalm, and J. Pelka, “Simulation of proximity printing,” Microelectron. Eng. vol. 10, pp 127-52, 1990.
4. Y.-K. Yoon, J.-H. Park, and M.G. Allen, “Multidirectional UV lithography for complex 3-D MEMS Structures,” IEEE Journal of MEMS (in press)