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Volumn , Issue , 2003, Pages 554-557
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Fabrication of 3D microstructures with inclined/rotated UV lithography
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Author keywords
[No Author keywords available]
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Indexed keywords
LITHOGRAPHY;
MASKS;
PHOTORESISTS;
SILICON WAFERS;
THICKNESS MEASUREMENT;
ULTRAVIOLET RADIATION;
MICROFABRICATION;
ULTRAVIOLET LITHOGRAPHY;
MICROSTRUCTURE;
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EID: 0038155509
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (26)
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References (5)
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