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Volumn , Issue , 2003, Pages 554-557

Fabrication of 3D microstructures with inclined/rotated UV lithography

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; MASKS; PHOTORESISTS; SILICON WAFERS; THICKNESS MEASUREMENT; ULTRAVIOLET RADIATION;

EID: 0038155509     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (26)

References (5)
  • 4
    • 11744310151 scopus 로고    scopus 로고
    • Recent developments in deep x-ray lithography
    • W. Ehrfeld and A. Schmidt, "Recent Developments in Deep X-ray Lithography", J. Vac. Sci. Technol. B., Vol. 16, pp. 3526-3534, 1998.
    • (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 3526-3534
    • Ehrfeld, W.1    Schmidt, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.