Submicron polymer structures with X-ray lithography and hot embossing

Microsystem Technologies

Volumn 14, Issue 9-11, 2008, Pages 1721-1725

  Mappes, Timo ^a   Worgull, Matthias ^b   Heckele, Mathias ^b   Mohr, Jürgen ^b  

^a UNIVERSITY OF KARLSRUHE   (Germany)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; LITHOGRAPHY;

HOT EMBOSSING; LIGA PROCESS; POLY-METHYL METHACRYLATE; POLYMER STRUCTURES; PROCESS CHAINS; SUB MICRONS; SUBMICRON STRUCTURING;

X RAY LITHOGRAPHY;

ABSORBERS; EMBOSSING; GOLD; HOT FORMING; LITHOGRAPHY; MICROSTRUCTURE; NICKEL; PLATING; POLYMETHYL METHACRYLATE;

EID: 49949105395     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-007-0499-6     Document Type: Conference Paper

References (12)

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