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Volumn 4, Issue 7, 2007, Pages 2453-2456
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Origins of n-type residual carriers in RF-MOMBE grown InN layers
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Author keywords
[No Author keywords available]
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Indexed keywords
BAND GAPS;
ELECTRON CONCENTRATIONS;
INN LAYERS;
LINEAR RELATIONS;
LINEARLY DEPENDENT;
NITRIDE SEMICONDUCTORS;
NITROGEN VACANCIES;
OXYGEN ATOMS;
OXYGEN CONCENTRATIONS;
OXYGEN INCORPORATION;
RESIDUAL CARRIER;
ATOMS;
CIVIL AVIATION;
CONCENTRATION (PROCESS);
CRYSTALS;
ELECTRIC CONDUCTIVITY;
METALS;
MOLECULAR BEAM EPITAXY;
NITRIDES;
NITROGEN;
NONMETALS;
OXYGEN;
SEMICONDUCTOR MATERIALS;
OXYGEN VACANCIES;
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EID: 49749141098
PISSN: 18626351
EISSN: None
Source Type: Journal
DOI: 10.1002/pssc.200674887 Document Type: Conference Paper |
Times cited : (4)
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References (6)
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