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Volumn 278, Issue 1-4, 2005, Pages 402-405
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Band gap widening of MBE grown InN layers by impurity incorporation
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Author keywords
A1. Characterization; A3. Molecular beam epitaxy; B1. Nitrides; B2. Semiconducting III V materials
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Indexed keywords
CARRIER CONCENTRATION;
CHARACTERIZATION;
CRYSTAL GROWTH;
CRYSTAL IMPURITIES;
MOLECULAR BEAM EPITAXY;
NITRIDES;
OXYGEN;
SEMICONDUCTOR MATERIALS;
ABSORPTION EDGE;
BAND GAP;
INN LAYERS;
RESIDUAL CARRIER CONCENTRATION;
INDIUM COMPOUNDS;
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EID: 18444389505
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.01.009 Document Type: Conference Paper |
Times cited : (6)
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References (6)
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