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Volumn 278, Issue 1-4, 2005, Pages 402-405

Band gap widening of MBE grown InN layers by impurity incorporation

Author keywords

A1. Characterization; A3. Molecular beam epitaxy; B1. Nitrides; B2. Semiconducting III V materials

Indexed keywords

CARRIER CONCENTRATION; CHARACTERIZATION; CRYSTAL GROWTH; CRYSTAL IMPURITIES; MOLECULAR BEAM EPITAXY; NITRIDES; OXYGEN; SEMICONDUCTOR MATERIALS;

EID: 18444389505     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.01.009     Document Type: Conference Paper
Times cited : (6)

References (6)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.