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Volumn 254, Issue 21, 2008, Pages 7064-7068

Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning

Author keywords

Dithiocarboxylic acids; Self assembled monolayers; Soft lithography

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHAIN LENGTH; CHAINS; ELECTRON DEVICE MANUFACTURE; GOLD COATINGS; SCANNING ELECTRON MICROSCOPY;

EID: 49549111582     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.05.192     Document Type: Article
Times cited : (11)

References (24)
  • 1
    • 0345979435 scopus 로고    scopus 로고
    • Ulman A. Chem. Rev. 96 (1996) 1533-1554
    • (1996) Chem. Rev. , vol.96 , pp. 1533-1554
    • Ulman, A.1
  • 17
    • 34548201270 scopus 로고    scopus 로고
    • Imaging of the enhanced "odd-even" effect in patterned ADTCA films was recently reported: K. Cimatu, H.J. Moore, T.R. Lee, S. Baldelli, J. Phys. Chem. C 111 (2007) 11751-11755.
    • Imaging of the enhanced "odd-even" effect in patterned ADTCA films was recently reported: K. Cimatu, H.J. Moore, T.R. Lee, S. Baldelli, J. Phys. Chem. C 111 (2007) 11751-11755.
  • 18
    • 49549111231 scopus 로고    scopus 로고
    • P.-C. Chen, National Chung Cheng University, M.S. Thesis, 2005.
    • P.-C. Chen, National Chung Cheng University, M.S. Thesis, 2005.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.