Nanoscale two-dimensional patterning on Si(001) by large-area interferometric lithography and anisotropic wet etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 4, 2004, Pages 1949-1952

  Lee, S C ^a   Brueck, S R J ^a  

^a University of New Mexico   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC WET ETCHING (AWE); INTERFEROMETRIC LITHOGRAPHY (IL); NANOSCALE SEMICONDUCTOR TECHNOLOGY;

ANISOTROPY; CRYSTAL ORIENTATION; ELECTROMECHANICAL DEVICES; ETCHING; FABRICATION; INTERFEROMETRY; MASKS; NANOSTRUCTURED MATERIALS; PHOTORESISTS; SEMICONDUCTING FILMS; THIN FILMS;

SEMICONDUCTING SILICON;

EID: 4944267244     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1771663     Document Type: Article

References (11)

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