Plasma chemistry of an expanding Ar/C2H2 plasma used for fast deposition of a-C:H

Diamond and Related Materials

Volumn 8, Issue 2-5, 1999, Pages 677-681

  Van De Sanden, M C M ^a   Van Hest, M F A M ^a   De Graaf, A ^a   Smets, A H M ^a   Letourneur, K G Y ^a   Boogaarts, M G H ^a   Schram, D C ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

A C:H; Plasma chemistry; Plasma deposition

Indexed keywords

ACETYLENE; ARGON; CARBON; DEPOSITION; DISSOCIATION; EMISSION SPECTROSCOPY; HYDROGEN; LIGHT EMISSION; MASS SPECTROMETRY; PLASMA APPLICATIONS;

LANGMUIR PROBE MEASUREMENT; PLASMA CHEMISTRY; PLASMA DEPOSITION;

AMORPHOUS FILMS;

EID: 0032608170     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(98)00254-4     Document Type: Article

References (17)

1. Gielen J.W.A.M., Kessels W.M.M., van de Sanden M.C.M., Schram D.C. J. Appl. Phys. 82:1997;2643.
2. Gielen J.W.A.M., Kleuskens P.R.M., van de Sanden M.C.M., van Ijzendoorn L.J., Schram D.C., Dekempeneer E.H.A., Meneve J. J. Appl. Phys. 80:1996;5986.
3. Gielen J.W.A.M., van de Sanden M.C.M., Kleuskens P.R.M., Schram D.C. Plasma Sources Sci. Technol. 5:1996;492.
4. Gielen J.W.A.M., van de Sanden M.C.M., Schram D.C. Appl. Phys. Lett. 69:1996;152.
5. van de Sanden M.C.M., Severens R.J., Gielen J.W.A.M., Paffen R.M.J., Schram D.C. Plasma Sources Sci. Technol. 5:1996;268.
6. M.F.A.M. van Hest, Internal report Eindhoven University of Technology, 1998.
7. F.F. Chen, in: R.H. Huddlestone, L.L. Stanley (Eds.), Plasma Diagnostic Techniques, Academic Press, New York, 1965, Chapter 4.
8. Hodges J.T., Looney J.P., van Zee R.D. J. Chem. Phys. 105:1996;10278.
9. Lehman K., Romanini R. J. Chem. Phys. 105:1996;23.
10. Meijer G., Boogaarts M.G.H., Jongma R.T., Parker D.H., Wodtke A.M. Chem. Phys. Lett. 217:1994;112.
11. W.H. Press, B.P. Flannery, S.A. Tenkolsky, W.T. Vetterling, Numerical Recipes in Pascal, Cambridge University Press, 1986.
12. van de Sanden M.C.M., Severens R.J., Kessels W.M.M., Meulenbroeks R.F.G., Schram D.C. J. Appl. Phys. 84:1998;2426.
13. M.G.H. Boogaarts, G.J. Brinkman, H.W.P. van der Heijden, P. Vankan, S. Mazouffre, J.A.M. van der Mullen, D.C. Schram, H.F. Döbele, Proc. 8th Int. Symp. Laser-Aided Plasma Diagnostics, Doorwerth, The Netherlands, 1997, p. 109.
14. Maier W.B. J. Chem. Phys. 42:1965;1790.
15. Mul P.M., McGowan J.W. Astrophys. J. 237:1980;749.
16. Millar T.J., DeFrees D.J., McLean A.D., Herbst E. Astron. Astrophys. 194:1988;250.
17. Meulenbroeks R.F.G., Engeln R.A.H., Box C., de Bari I., van de Sanden M.C.M., van der Mullen J.A.M., Schram D.C. Phys. Plasmas. 2:1995;1002.