Investigation of structural and ferroelectric properties of pulsed-laser-ablated epitaxial Nd-doped bismuth titanate films

Journal of Applied Physics

Volumn 96, Issue 6, 2004, Pages 3408-3412

  Garg, A ^a,c   Snedden, A ^b   Lightfoot, P ^b   Scott, J F ^a   Hu, X ^a   Barber, Z H ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF ST ANDREWS   (United Kingdom)

^c INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; DOPING (ADDITIVES); ELECTRODES; EPITAXIAL GROWTH; FERROELECTRICITY; LASER ABLATION; LEAKAGE CURRENTS; LIGHT POLARIZATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NEODYMIUM; PHYSICAL VAPOR DEPOSITION; REMANENCE; STOICHIOMETRY; TITANIUM COMPOUNDS; X RAY DIFFRACTION;

BIPOLAR SWITCHING; FERROELECTRIC PROPERTIES; REMANENT POLARIZATION; STRUCTURAL PROPERTIES;

BISMUTH COMPOUNDS;

EID: 4944255092     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1766097     Document Type: Article

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