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Volumn , Issue , 1992, Pages 356-359
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Microstructure-induced Schottky barrier effects in barium strontium titanate (BST) thin films for 16 and 64 Mbit (DRAM cells)
a,b,c b d d d a,b,c a,b,c a,b,c a,b,c
a
Symetris Corp
*
(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
CAPACITANCE;
DYNAMIC RANDOM ACCESS STORAGE;
FERROELECTRIC MATERIALS;
GRAIN BOUNDARIES;
SCHOTTKY BARRIER DIODES;
STRONTIUM TITANATES;
THIN FILMS;
TITANIUM COMPOUNDS;
BARIUM STRONTIUM TITANATE THIN FILMS;
BST THIN FILMS;
CAPACITANCE VOLTAGE CHARACTERISTIC;
CURRENT VOLTAGE;
DEPLETION REGION;
DYNAMIC RANDOM ACCESS MEMORY;
FINE GRAINED;
SCHOTTKY BARRIERS;
BARIUM STRONTIUM TITANATE;
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EID: 84887826529
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ISAF.1992.300707 Document Type: Conference Paper |
Times cited : (16)
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References (10)
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