Performance summary on a high power dense plasma focus x-ray lithography point source producing 70 nm line features in AlGaAs microcircuits

Review of Scientific Instruments

Volumn 75, Issue 8, 2004, Pages 2551-2559

  Petr, Rodney ^a   Bykanov, Alexander ^a   Freshman, Jay ^a   Reilly, Dennis ^a   Mangano, Joseph ^a   Roche, Maureen ^b   Dickenson, Jason ^b   Burte, Mitchell ^b   Heaton, John ^b  

^a Science Research Laboratory   (United States)

^b BAE SYSTEMS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DENSE PLASMA FOCUS (DPF); MICROCIRCUITS; PLASMA DISCHARGE; THERMAL MANAGEMENT; X-RAY ENERGY SCALING;

ACTIVATION ENERGY; ALUMINUM COMPOUNDS; CARRIER CONCENTRATION; HEAT TRANSFER; HIGH TEMPERATURE EFFECTS; MICROELECTRONICS; MONOLITHIC MICROWAVE INTEGRATED CIRCUITS; PHASE SHIFT; PHOTORESISTS; SHOCK WAVES; SURFACE PROPERTIES; X RAY LITHOGRAPHY;

PLASMA APPLICATIONS;

EID: 4944241874     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1771502     Document Type: Article

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