High uniformity collimator for X-ray proximity lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4144, Issue , 2000, Pages 228-237

  Cash, Webster ^a  

^a UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUXES; LITHOGRAPHY; MIRRORS; X RAYS;

OPTICAL CHANNELS;

OPTICAL COLLIMATORS;

EID: 0034505765     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.405897     Document Type: Conference Paper

References (6)