Phase transformation of Ni33Fe67 and Ni 21Fe79 films grown on SiO2/Si(1 0 0)

Physica B: Condensed Matter

Volumn 362, Issue 1-4, 2005, Pages 255-265

  Chen, Xiaobai ^a,b   Qiu, Hong ^a   Wu, Ping ^a   Wang, Fengping ^a   Pan, Liqing ^a   Tian, Yue ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b BEIJING TECHNOLOGY AND BUSINESS UNIVERSITY   (China)

Author keywords

Magnetization; Ni21Fe79 film; Ni33Fe67 film; Phase transformation; Resistivity; Sputtering

Indexed keywords

ANNEALING; ELECTRIC CONDUCTIVITY; ENERGY DISPERSIVE SPECTROSCOPY; FILM GROWTH; GRAIN BOUNDARIES; MAGNETIZATION; MAGNETRON SPUTTERING; PHASE TRANSITIONS; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON; SPUTTER DEPOSITION; X RAY DIFFRACTION;

FILM STRUCTURES; NI21FE79 FILM; NI33FE67 FILM; VOID NETWORKS;

NICKEL COMPOUNDS;

EID: 17844397999     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2005.02.018     Document Type: Article

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