Photothermal characterization of thin films and coatings

Vacuum

Volumn 82, Issue 12, 2008, Pages 1461-1465

  Macedo, F ^a   Goren A ^a   Vaz, F ^a   Nzodoum Fotsing, J L ^b   Gibkes, J ^b   Bein, B K ^b  

^a UNIVERSITY OF MINHO   (Portugal)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Coatings; Deposition; IR radiometry; Non destructive characterization; On line control; Photothermal; Sputtering; Thermal properties

Indexed keywords

CLADDING (COATING); COATINGS; MODULATION; REACTIVE SPUTTERING; SPUTTER DEPOSITION; THICK FILMS;

COATING DEPOSITION; DEPOSITION; IR RADIOMETRY; MEASURING TECHNIQUES; MODULATION FREQUENCIES; NON-CONTACT; NON-DESTRUCTIVE; NON-DESTRUCTIVE CHARACTERIZATION; ON-LINE CONTROL; ON-LINE CONTROLS; PHOTOTHERMAL; QUANTITATIVE INTERPRETATION; REACTIVE MAGNETRON SPUTTERING; SPUTTERING; THERMAL PROPERTIES; THIN FILMS; WAVE PHASE;

MAGNETRON SPUTTERING;

EID: 49149103186     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.03.007     Document Type: Article

References (13)

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