A novel advanced process control for semiconductor manufacturing: Dual proximate inverse system feedback control

ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings

Volumn , Issue , 2008, Pages 167-172

  Hua, Sheng ^a   Cheng, Xiu Lan ^a   Jin, Tong Dan ^b  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b TEXAS A AND M INTERNATIONAL UNIVERSITY   (United States)

Author keywords

Advanced process control; Dual proximate inverse system feedback control; Inverse control

Indexed keywords

ADVANCED PROCESS CONTROL; ASYMPTOTICALLY STABLE; CLASSICAL METHODS; CONTROL LAWS; DUAL PROXIMATE INVERSE SYSTEM FEEDBACK CONTROL; INVERSE CONTROL; INVERSE SYSTEMS; ION IMPLANTERS; ORDERS-OF-MAGNITUDE; SEMICONDUCTOR MANUFACTURING; SEMICONDUCTOR TOOLS; SUFFICIENT CONDITIONS; SYSTEMATICAL ERROR;

CHEMICAL PLANTS; CONTROL THEORY; ELECTRIC CONDUCTIVITY; ERROR ANALYSIS; FEEDBACK CONTROL; INTELLIGENT CONTROL; MODEL STRUCTURES; PRODUCTION CONTROL; QUALITY CONTROL; SEMICONDUCTOR MATERIALS; TRANSPORT AIRCRAFT;

PROCESS CONTROL;

EID: 49149109886     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASMC.2008.4529023     Document Type: Conference Paper

References (19)

1. Gabriel. G. Barna, APC in the Semiconductor Industry, History and Near Term Prognosis, Advanced Semiconductor Manufacturing Conference and Workshop, 1996. ASMC96 Proceedings. IEEE/SEMI 1996 12-14 Nov. 1996Page(s):364-369
2. Moshe Sarfaty, Arulkumar Shanmugasundram, Alexander Schwarm, Joseph Paik, Jimin Zhang, Rong Pan, Martin J.Seamons, Howard Li, Raymond Hung, Suketu Parikh Advance Process Control Solutions for Semiconductor Manufacturing Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop 30 April-2 May 2002 Page(s):101-106
3. Christopher Could , Advanced Process Control: Basic Functionality Requirements for Lithography , Advanced Semiconductor Manufacturing Conference, 2001 IEEE/SEMI. 23-24 April 2001 Page(s):49-53
4. Vivek Bakshi,Benchmarking of Commercial Software for Fault Detection and Classification (FDC) of Plasma Etchers for Semiconductor Manufacturing Equipment, Proceedings of the American Control Conference, Albuquerque, New Mexico June 1997, P1579-1582
5. James Moyne, Victor Solakhian, and Alexander Yershov,Malcolm Anderson and Debbie Mockler-Hebert, Development and Deployment of a Multi-Component Advanced Process Control System for an Epitaxy Tool, Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop 30 April-2 May 2002 Page(s):125-130
6. H.C.Wu,C.T.Chang,.H.Chen,C.Y.Lee,C.J.Chang, J.C. Ko,M.S.Zhou,M.S.Liang, Fault Detection and Classification of Plasma CVD tool, P123-125
7. Mao-Shiung Chen, T.F. Yen, z.ast;Barry Coonan, Real-time Fault Detection and Classification for Manufacturing Etch Tools, P103-106
8. Tuung Luoh, Chang-Wei Liao, Li-Chung Yang, Ling-WuuYang, Chi-Tung Huang, Hsueh-Hao Shih, Kuang-Chao Chen, Henry Chung, Joseph Ku and Chih-Yuan Lu,Process Optimization by Advanced Process Control with Fault Detection System for Flash Memory, P71-74
9. Sang Jeen Hong,Gary S. May,Neural Network-Based Real-Time Malfunction Diagnosis of Reactive Ion Etching Using In Situ Metrology Data , IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, VOL. 17, NO. 3, AUGUST 2004, P408-421
10. Linda Sattler, Phil E. Hecker, Rangesh Raghavan and He Lin, Reducing Costs and Increasing Throughput Using Model-Based Process Control on Sputtering Systems , Electronics Manufacturing Technology Symposium, 1998. Twenty-Third IEEE/CPMT 19-21 Oct. 1998 Page(s):409-414
11. Li Chunwen, Feng Yuankun, The inverse System method and its Application, Journal of Tsinghua University (Science and Technology), Vol. 26 No. 2, 1986, Page(s):105-114
12. Harnold, C.-L.-M., Lee, K.Y., Free-model based neural networks for a boiler-turbine plant, Power Engineering Society Winter Meeting, 2000. IEEE Volume 2, 23-27 Jan. 2000 Page(s):1140-1144
13. CHEN G Renhong, TU Fengsheng, A NONL INEAR INVERSE-SYSTEM OF A SYNCHRONOUS MOTOR UNDER DYNAMIC-DECOM POSISION AND ITS APPLICATION, Acta Scientiarum Naturalium U niversitatis Nankaiensis, Vol. 35 No. 1, Mar 2002, Page(s):53-57
14. Zhang Xinghua, Dai Xianzhong, Digital implementation of neural network inverse control for induction motor drives, Chinese Journal of ScienDIFCic Instrument, Vol.127 No.110, Oct 2006, Page(s):1213-1217
15. [15]Bernard Widrow, Eugene Walach, Adaptive Inverse Control[M], Prentice-Hall Inc, 1996.
16. Herzallah, R, Lowe, D. Probability distribution modeling to improve stability in nonlinear MIMO control, Control Applications, 2003. CCA 2003. Proceedings of 2003 IEEE Conference on Volume 2, 23-25 June 2003 Page(s):954-959
17. Jingang Yi, Ye Sheng, Xu C.S., Neural network based uniformity profile control of linear chemical-mechanical planarization, Semiconductor Manufacturing, IEEE Transactions on Volume 16, Issue 4, Nov. 2003 Page(s):609-620
18. Yang Liyong, Li Zhengxi, Li Huade, Wang Jiuhe, Adaptive inverse control of induction motor drive system, Control Theory & Applications, Vol.24 No.l, Feb. 2007, Page(s):95-98
19. Fu Xiangyun, Zeng Fanpeng, Wang Jianze, Mou Xianmin, Ji Yanchao, Adaptive inverse control for STATCOM, ELECTRIC MACHINES AND CONTROL, Vol.10 No.6, Nov. 2006, Page(s):636