Real-time fault detection and classification for manufacturing etch tools

2004 Semiconductor Manufacturing Technology Workshop Proceedings, SMTW

Volumn , Issue , 2004, Pages 103-106

  Chen, Mao Shiung ^b   Yen, T F ^b   Coonan, Barry ^a  

^a ProMOS Technologies Inc   (Taiwan)

^b Straatum   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COSTS; ELECTRIC FAULT LOCATION; PATTERN RECOGNITION; PROBLEM SOLVING; PROCESS CONTROL; REAL TIME SYSTEMS;

FAULT WAFERS; MANUFACTURING ETCH TOOLS; REAL-TIME FAULT DETECTION; SENSOR DEVIATION;

PLASMA ETCHING;

EID: 17044368674     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

1. C. Fiorletta, "Capabilities and lessons from 10 years of APC success", Solid State Technology, February 2004.
2. T. F. Edgar et al., "Automatic control in microelectronics manufacturing: Practices, challenges and possibilities", Automatica, 36, pp. 1567-1603, 2000.
3. J. V. Scanlan, M. B. Hopkins, K. O'Leary, "Knowledge-based process control for fault detection and classification", Semiconductor Manufacturing, vol. 4 (10), 2003.