Application of C60 to photosensitive diazo /PVA resist

Journal of Photopolymer Science and Technology

Volumn 21, Issue 1, 2008, Pages 59-62

  Harada, Kieko ^a   Taniai, Tetsuyuki ^a   Nakada, Masahiro ^a   Hamana, Hiroshi ^b   Matsuda, Kiyomi ^c   Takahara, Shigeru ^d   Sugita, Kazuyuki ^d  

^a CHIBA INSTITUTE OF TECHNOLOGY   (Japan)

^b SAITAMA INSTITUTE OF TECHNOLOGY   (Japan)

^c NIHON UNIVERSITY   (Japan)

^d CHIBA UNIVERSITY   (Japan)

Author keywords

18 crown 6; C60; Hardness; Photosensitive diazo compound; Polyethylene glycol 300

Indexed keywords

EID: 49049092154     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.59     Document Type: Article

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