Control of photo and thermal decomposition of diazo/PVA and diazo/PVAc resist with inclusion compounds

Journal of Photopolymer Science and Technology

Volumn 18, Issue 2, 2005, Pages 187-192

  Harada, Kieko ^a   Kushida, Masahito ^a   Miyakawa, Shinichi ^a   Takahara, Shigeru ^a   Sugita, Kazuyuki ^a  

^a CHIBA UNIVERSITY   (Japan)

Author keywords

Diazo PVA resist; Inclusion compounds; Photosensitive diazo compound

Indexed keywords

EID: 22144499581     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.18.187     Document Type: Article

References (14)

1. K.Harada, M.Kushida, K.Saito, K.Sugita and H.Iida, "Micro- and Nanopattering Polymers" H.Ito, E.Reichmanis, O.Naramasu and T.Ueno, eds., ACS Symp. Ser.706, Amer. Chem. Soc., Washington, D.C., 1998, pp. 126-133
2. K.Harada, M.Kushida, K.Saito, K.Sugita and H.Iida, J. Imaging Sci. and Technol., 46, 159 (2002)
3. S.Nonogaki, H.Morishita, Y.Tomita and M.Nishigawa, J.Imaging Sci. and Tecnol., 30, 86 (1986)
4. T.Usami, T.Tanaka and S.Ishige, Electrophotography, 26, 115 (1987)
5. Y.Yoshida and S. Tatsuta, Electrophotography, 26, 120 (1987)
6. R.A.Bartsch, H.Chen, N.F.Haddoch and P.N.Juri, J. Am. Chem. Soc., 98, 6753 (1976)
7. T.Kuokkanen and P.O.I.Virtanen, Acta Chem. Scand, ser. B, 33, 725 (1976)
8. K.Harada, M.Kushida and K.Sugita, J. Soc. Photogr. Sci. Technol. Japan, 46 , 600 (1993)
9. K.Harada, K.Sugita and H.Iida, J.Imaging Sci. and Technol., 38, 13 (1994)
10. K.Harada, N.Ueno and K.Sugita, Kobunshronbunshu, 45, 4 (1988)
11. K.Harada, N.Ueno, K.Sugita and S.Suzuki, J. Soc. Photogr. Sci., Technol. Jpn., 51, 288 (1988)
12. th Inter'I Conf. on Photopolymers; H.Ito, M.M. Kojasteh and W.Li, Eds., Soc. Plastics Eng. Inc., Mid Hudson Section, Hopewell Junction, N.Y., 2001) pp. 395-398
13. K.Fukunishi, J.Hira, H.Yamaoka and M. Nomura, J. Chem. Soc. Perkin Trans. I, p.991 (1985)
14. th Inter'I Conf. on Photopolymers; H.Ito, P.Rao Varanasi , M.M. Kojasteh and R.Chen, Eds., Soc. Plastics Eng. Inc., Mid Hudson Section, Hopewell Junction, NY,.2003) pp.369-373