Highly Photosensitive Diazo Compounds as Photoacid Generators for Chemically Amplified Resists

ACS Symposium Series

Volumn 706, Issue , 1998, Pages 126-133

  Harada, Kieko ^a   Kushida, Masahito ^a   Saito, Kyoichi ^a   Sugita, Kazuyuki ^a   Iida, Hirotada ^b  

^a CHIBA UNIVERSITY   (Japan)

^b Research Center   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0345985755     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: 10.1021/bk-1998-0706.ch010     Document Type: Article

References (10)

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7. Harada, K.; Ueno, N.; Sugita, K., Kobunshi Ronbunshu, 1988, 47, 295.
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