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Volumn , Issue , 2003, Pages 37-40

Operating SOI CMOS technology in extreme environments

Author keywords

CMOS technology; Cryogenics; Extraterrestrial measurements; Probes; Protons; Robustness; Space missions; Space technology; Temperature distribution; Threshold voltage

Indexed keywords

CMOS INTEGRATED CIRCUITS; CRYOGENICS; INTEGRATED CIRCUITS; PROBES; PROTONS; ROBUSTNESS (CONTROL SYSTEMS); TEMPERATURE DISTRIBUTION; THRESHOLD VOLTAGE;

EID: 48949122740     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SMIC.2003.1196663     Document Type: Conference Paper
Times cited : (8)

References (9)
  • 1
    • 0033314166 scopus 로고    scopus 로고
    • Worst Case Total Dose Radiation Response of 0.35 μm SOI CMOSFETs
    • Dec.
    • S.T. Liu, S. Balster, S. Sinha and W.C. Jenkins, "Worst Case Total Dose Radiation Response of 0.35 μm SOI CMOSFETs," IEEE Transactions on Nuclear Science, vol. 46, no. 6, pp. 1817-1823, Dec. 1999.
    • (1999) IEEE Transactions on Nuclear Science , vol.46 , Issue.6 , pp. 1817-1823
    • Liu, S.T.1    Balster, S.2    Sinha, S.3    Jenkins, W.C.4
  • 2
    • 0032317363 scopus 로고    scopus 로고
    • Total Dose radiation Hard 0.35 μm SOI CMOS Technology
    • Dec.
    • S.T. Liu, W.C. Jenkins and H.L. Hughes, "Total Dose radiation Hard 0.35 μm SOI CMOS Technology," IEEE Transactions on Nuclear Science, vol. 45, no. 6, pp. 2442-2449, Dec. 1998.
    • (1998) IEEE Transactions on Nuclear Science , vol.45 , Issue.6 , pp. 2442-2449
    • Liu, S.T.1    Jenkins, W.C.2    Hughes, H.L.3
  • 3
    • 0032595354 scopus 로고    scopus 로고
    • Total Resistance Slope-based Effective Channel Mobility Extraction Method for Deep Submicrometer CMOS Technology
    • Sept.
    • G. Niu, J.D. Cressler, S.J. Mathew, S. Subbanna, "Total Resistance Slope-based Effective Channel Mobility Extraction Method for Deep Submicrometer CMOS Technology," IEEE Transactions on Electron Devices, vol. 46, no. 9, pp. 1912-1914, Sept. 1999.
    • (1999) IEEE Transactions on Electron Devices , vol.46 , Issue.9 , pp. 1912-1914
    • Niu, G.1    Cressler, J.D.2    Mathew, S.J.3    Subbanna, S.4
  • 4
    • 0024718053 scopus 로고
    • Mos Device Modeling at 77 K
    • Aug.
    • S. Selberherr, "Mos Device Modeling at 77 K," IEEE Transactions on Electron Devices, vol. 36, no. 8, pp. 1464-1674, Aug. 1989.
    • (1989) IEEE Transactions on Electron Devices , vol.36 , Issue.8 , pp. 1464-1674
    • Selberherr, S.1
  • 6
    • 0024122131 scopus 로고
    • Assessment of SOI Technologies for Hardening
    • J.L. Leray, "Assessment of SOI Technologies for Hardening," Microelectronic Engineering, vol. 8, pp. 187-200, 1988.
    • (1988) Microelectronic Engineering , vol.8 , pp. 187-200
    • Leray, J.L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.