ADVANTOXTM more radiation-resistant than full dose SIMOX

IEEE International SOI Conference

Volumn , Issue , 1997, Pages 148-149

  Liu, S T ^a   Hughes, H ^a   Jenkins, W ^a   Allen, L ^a  

^a HONEYWELL   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION IMPLANTATION; MOSFET DEVICES; SEMICONDUCTOR DEVICE MODELS; SILICON WAFERS;

RADIATION RESPONSE; SEPARATION BY IMPLANTATION OF OXYGEN (SIMOX); THRESHOLD VOLTAGE;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0031353750     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)