Using simultaneous deposition and rapid growth to produce nanostructured composite films of AlN/TiN by chemical vapor deposition

Journal of the American Ceramic Society

Volumn 79, Issue 5, 1996, Pages 1335-1342

  Liu, Yi Jun ^a   Kim, Hee Joon ^b   Egashira, Yasuyuki ^a   Kimura, Hisamichi ^c   Komiyama, Hiroshi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CERAMIC MATERIALS; CHEMICAL VAPOR DEPOSITION; COMPOSITE MATERIALS; FRACTURE TESTING; GRAIN SIZE AND SHAPE; SYNTHESIS (CHEMICAL); TITANIUM NITRIDE;

ALUMINUM NITRIDE; NANOSTRUCTURED COMPOSITE FILMS;

NANOSTRUCTURED MATERIALS;

EID: 0030149473     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1996.tb08594.x     Document Type: Article

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