Real-time control of track etching and recent experiments relevant to micro and nano fabrication

Radiation Measurements

Volumn 43, Issue SUPPL.1, 2008, Pages

  Spohr, Reimar ^a,b  

^a GSI HELMHOLTZZENTRUM FÜR SCHWERIONENFORSCHUNG GMBH   (Germany)

^b European Network of Ion Track Technology EuNITT   (Germany)

Author keywords

Channels; Conduction; Etching; Ion track; Nano wire; Real time; Replication; Single track

Indexed keywords

ELECTROLYSIS; ELECTROLYTIC CELLS; ETCHING; OPTICAL DESIGN; REAL TIME CONTROL; REAL TIME SYSTEMS;

CELL SYSTEMS; COMPUTER CONTROLLED; ELECTRO REPLICATION; ETCH RATES; NANO FABRICATION; REAL TIME CONTROL (RTC); SENSITIVE MATERIALS; TRACK ETCHING;

EXPERIMENTS;

EID: 48549096260     PISSN: 13504487     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.radmeas.2008.03.078     Document Type: Article

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