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Volumn 43, Issue SUPPL.1, 2008, Pages

Photoluminescence from Si-implanted Si3 N4 films

Author keywords

Electron spin resonance; Photoluminescence; Si ion implantation; Si3 N4 layer; Silicon nano clusters

Indexed keywords

SILICON;

EID: 48549086456     PISSN: 13504487     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.radmeas.2008.04.039     Document Type: Article
Times cited : (3)

References (18)
  • 1
    • 0141775174 scopus 로고
    • Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers
    • Canham L.T. Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers. Appl. Phys. Lett. 57 10 (1990) 1046-1048
    • (1990) Appl. Phys. Lett. , vol.57 , Issue.10 , pp. 1046-1048
    • Canham, L.T.1
  • 2
    • 0031102861 scopus 로고    scopus 로고
    • Visible light emission from Si nanocrystals grown by ion implantation and subsequent annealing
    • Guha S., Pace M.D., Dunn D.N., and Singer I.L. Visible light emission from Si nanocrystals grown by ion implantation and subsequent annealing. Appl. Phys. Lett. 70 10 (1997) 1207-1209
    • (1997) Appl. Phys. Lett. , vol.70 , Issue.10 , pp. 1207-1209
    • Guha, S.1    Pace, M.D.2    Dunn, D.N.3    Singer, I.L.4
  • 3
    • 0842349046 scopus 로고    scopus 로고
    • 4 thin ribbons grown by a high-temperature thermal-decomposition/nitridation route
    • 4 thin ribbons grown by a high-temperature thermal-decomposition/nitridation route. Chem. Eur. J. 10 2 (2004) 554-558
    • (2004) Chem. Eur. J. , vol.10 , Issue.2 , pp. 554-558
    • Hu, J.1    Bando, Y.2    Liu, Z.3    Xu, F.4    Sekiguchi, T.5    Zhan, J.6
  • 4
    • 0642270756 scopus 로고    scopus 로고
    • Photoluminescence mechanism in surface-oxidized silicon nanocrystals
    • Kanemitsu Y., Okamoto S., Otobe M., and Oda S. Photoluminescence mechanism in surface-oxidized silicon nanocrystals. Phys. Rev. B 55 12 (1997) 7375-7378
    • (1997) Phys. Rev. B , vol.55 , Issue.12 , pp. 7375-7378
    • Kanemitsu, Y.1    Okamoto, S.2    Otobe, M.3    Oda, S.4
  • 5
    • 0030616229 scopus 로고    scopus 로고
    • A silicon/iron-disilicide light-emitting diode operating at a wavelength of 1.5 μ m
    • Leong D., Harry M., Reeson K.J., and Homewood K.P. A silicon/iron-disilicide light-emitting diode operating at a wavelength of 1.5 μ m. Nature 387 (1997) 686-688
    • (1997) Nature , vol.387 , pp. 686-688
    • Leong, D.1    Harry, M.2    Reeson, K.J.3    Homewood, K.P.4
  • 10
    • 1342307159 scopus 로고    scopus 로고
    • Strong blue and violet photoluminescence and electroluminescence from germanium-implanted and silicon-implanted silicon-dioxide layers
    • Rebohle L., von Borany J., Yankov R.A., Skorupa W., Tyschenko I.E., Fröb H., and Leo K. Strong blue and violet photoluminescence and electroluminescence from germanium-implanted and silicon-implanted silicon-dioxide layers. Appl. Phys. Lett. 71 19 (1997) 2809-2811
    • (1997) Appl. Phys. Lett. , vol.71 , Issue.19 , pp. 2809-2811
    • Rebohle, L.1    von Borany, J.2    Yankov, R.A.3    Skorupa, W.4    Tyschenko, I.E.5    Fröb, H.6    Leo, K.7
  • 12
    • 0032099580 scopus 로고    scopus 로고
    • Optical properties of silicon nanoclusters fabricated by ion implantation
    • Shimizu-Iwayama T., Kurumad N., Hole D.E., and Townsend P.D. Optical properties of silicon nanoclusters fabricated by ion implantation. J. Appl. Phys. 83 11 (1998) 6018-6022
    • (1998) J. Appl. Phys. , vol.83 , Issue.11 , pp. 6018-6022
    • Shimizu-Iwayama, T.1    Kurumad, N.2    Hole, D.E.3    Townsend, P.D.4
  • 15
    • 0000060393 scopus 로고    scopus 로고
    • Modeling the contribution of quantum confinement to luminescence from silicon nanoclusters
    • Trwoga P.F., Kenyon A.J., and Pitt C.W. Modeling the contribution of quantum confinement to luminescence from silicon nanoclusters. J. Appl. Phys. 83 7 (1998) 3789-3794
    • (1998) J. Appl. Phys. , vol.83 , Issue.7 , pp. 3789-3794
    • Trwoga, P.F.1    Kenyon, A.J.2    Pitt, C.W.3
  • 17
    • 48549088053 scopus 로고    scopus 로고
    • Ziegler, J.F., 1992. Ion Implantation Technology. North-Holland, Amsterdam.
    • Ziegler, J.F., 1992. Ion Implantation Technology. North-Holland, Amsterdam.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.