Fabrication of transparent capacitive structure by self-assembled thin films

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 6, 2008, Pages 3008-3012

  Zhang, Q ^a   Shin, Y J ^a   Hua, F ^a   Saraf, L V ^b   Matson, D W ^b  

^a Clarkson University   (United States)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

Electrostatic self assembly; Flexible electronics; Nanoparticle; Transparent electronics

Indexed keywords

CAPACITIVE STRUCTURE; DEVICE FABRICATIONS; DIFFERENT FREQUENCIES; ELECTRONIC DEVICES; ELECTROSTATIC SELF-ASSEMBLY; FLEXIBLE ELECTRONICS; INDIUM TIN OXIDE; MATERIAL SYNTHESIS; MICRO-PATTERNING; MOLECULAR ORDERS; MULTI LAYERING; NANO-FABRICATION; NANO-MATERIALS; NANOPARTICLE; OPTICAL TRANSPARENCY; QUARTZ CRYSTALS; SELF- ASSEMBLIES; SELF-ASSEMBLED SILICA; SELF-ASSEMBLED THIN FILMS; SILICA NANO PARTICLES; THIN-FILM LAYERS; TRANSPARENT ELECTRONICS; TRANSPARENT SUBSTRATES; VISIBLE SPECTRUM;

CAPACITANCE; CAPACITORS; CONDUCTIVE FILMS; DIELECTRIC DEVICES; ELECTRIC CURRENTS; ELECTRIC EQUIPMENT; ENERGY STORAGE; FABRICATION; LIQUID PHASE EPITAXY; NANOPARTICLES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; OPTICAL DESIGN; OXIDE MINERALS; PHOTOLITHOGRAPHY; PLASMA DIAGNOSTICS; QUARTZ; SELF ASSEMBLY; SILICA; SILICATE MINERALS; SILICON COMPOUNDS; SOLIDS; THICK FILMS; THIN FILM DEVICES; THIN FILMS; TIN; TITANIUM COMPOUNDS; VAPOR DEPOSITION;

FILM PREPARATION;

EID: 48449092493     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.075     Document Type: Article

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