Fabrication of three-dimensional photonic crystals using silicon micromachining

Applied Physics Letters

Volumn 85, Issue 11, 2004, Pages 2125-2127

  Venkataraman, Sriram ^a   Schneider, Garrett J ^a   Murakowski, Janusz ^a   Shi, Shouyuan ^a   Prather, Dennis W ^a  

^a UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFEROMETRIC LITHOGRAPHY; PHOTONIC CRYSTALS; POLYMER PASSIVATION; SILICON MICROMACHINING;

ANISOTROPY; CRYSTAL STRUCTURE; HOLOGRAPHY; MASKS; MICROMACHINING; PHOTONS; REACTIVE ION ETCHING; SEMICONDUCTING SILICON;

CRYSTALS;

EID: 5444228220     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1790594     Document Type: Article

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