Photoemission study of CF4 rf-Plasma treated multi-wall carbon nanotubes

Carbon

Volumn 46, Issue 10, 2008, Pages 1271-1275

  Felten, A ^a   Ghijsen, J ^a   Pireaux, J J ^a   Johnson, R L ^b   Whelan, C M ^c   Liang, D ^d   Van Tendeloo, G ^d   Bittencourt, Carla ^e  

^a UNIVERSITY OF NAMUR   (Belgium)

^b UNIVERSITY OF HAMBURG   (Germany)

^c IMEC   (Belgium)

^d UNIVERSITY OF ANTWERP   (Belgium)

^e UNIVERSITY OF MONS   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

GRAFTING (CHEMICAL); PLASMA APPLICATIONS; PLASMA ETCHING; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; WAVE PLASMA INTERACTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC CONCENTRATION; C-F BONDS; CF 4; EXPOSED TO; EXPOSURE-TIME; FLUORINE ATOMS; HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; PLASMA TREATMENT; RF PLASMA; X-RAY PHOTOELECTRONS;

MULTIWALLED CARBON NANOTUBES (MWCN);

EID: 47349131295     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2008.04.027     Document Type: Article

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