Study of 1.5 keV Ar atoms beam induced ripple formation on Si surface by atomic force microscopy

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 244, Issue 1, 2006, Pages 95-99

  Kulriya, P K ^a   Tripathi, A ^a   Kabiraj, D ^a   Khan, S A ^a   Avasthi, D K ^a  

^a INTER UNIVERSITY ACCELERATOR CENTRE   (India)

Author keywords

Atomic force microscopy; Low energy atom beam; Ripple pattern; Sputtering

Indexed keywords

FLUENCES; LOW ENERGY ATOM BEAM; RIPPLE PATTERN; TOPOGRAPHY;

ATOMIC BEAMS; ATOMIC FORCE MICROSCOPY; MORPHOLOGY; SILICON; SPUTTERING; SURFACE PROPERTIES;

SURFACE TREATMENT;

EID: 47149107276     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.11.075     Document Type: Conference Paper

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