-
1
-
-
0000893718
-
Particulate Contamination and Microelectronics Manufacturing: An Introduction
-
-
Cooper, D. W. 1986. Particulate Contamination and Microelectronics Manufacturing: An Introduction. Aerosol Science and Technology 5 (3): 287-99.
-
(1986)
Aerosol Science and Technology
, vol.5
, Issue.3
, pp. 287-299
-
-
Cooper, D.W.1
-
2
-
-
67650009791
-
Particle Interaction with Integrated Circuits
-
, ed. R. P. Donovan, New York: Marcel Dekker, Inc
-
Fisher, W. G. 1990. Particle Interaction with Integrated Circuits. In Particle Control for Semiconductor Manufacturing, ed. R. P. Donovan, 1-8. New York: Marcel Dekker, Inc.
-
(1990)
Particle Control for Semiconductor Manufacturing
, pp. 1-8
-
-
Fisher, W.G.1
-
3
-
-
0035498686
-
Localization and Detailed Investigation of Gate Oxide Integrity Defects in Silicon MOS Structures
-
-
Huth, S., O. Breitenstein, A. Huber, D. Dantz, and U. Lambert. 2001. Localization and Detailed Investigation of Gate Oxide Integrity Defects in Silicon MOS Structures. Microelectronic Engineering 59: 109-13.
-
(2001)
Microelectronic Engineering
, vol.59
, pp. 109-113
-
-
Huth, S.1
Breitenstein, O.2
Huber, A.3
Dantz, D.4
Lambert, U.5
-
4
-
-
0029516083
-
Silicon-on-insulator Material Qualification for Low-Power Complementary Metal-oxide Semiconductor Application
-
-
Mendicino, M. A., P. K. Vasudev, P. Maillot, C. Hoener, J. Baylis, J. Bennett, T. Boden, S. Jackett, K. Huffman, and M. Goodwin. 1995. Silicon-on-insulator Material Qualification for Low-Power Complementary Metal-oxide Semiconductor Application. Thin Solid Films 270: 578-83.
-
(1995)
Thin Solid Films
, vol.270
, pp. 578-583
-
-
Mendicino, M.A.1
Vasudev, P.K.2
Maillot, P.3
Hoener, C.4
Baylis, J.5
Bennett, J.6
Boden, T.7
Jackett, S.8
Huffman, K.9
Goodwin, M.10
-
5
-
-
0032046623
-
In-Situ Analysis of Particle Contamination in Magnetron Sputtering Processes
-
-
Selwyn, G. S., C. A. Weiss, F. Sequeda, and C. Huang. 1998. In-Situ Analysis of Particle Contamination in Magnetron Sputtering Processes. Thin Solid Films 317: 85-92.
-
(1998)
Thin Solid Films
, vol.317
, pp. 85-92
-
-
Selwyn, G.S.1
Weiss, C.A.2
Sequeda, F.3
Huang, C.4
-
6
-
-
0032157629
-
Chemical Integration and Contamination Control in Hard Disk Drive Manufacturing
-
, Sept.-Oct
-
Nebenzahl, L., R. Nagarajan, L. Volpe, J. S. Wong, and O. Melroy. 1998. Chemical Integration and Contamination Control in Hard Disk Drive Manufacturing. Journal of the IEST 41 (Sept.-Oct.): 31-5.
-
(1998)
Journal of the IEST
, vol.41
, pp. 31-35
-
-
Nebenzahl, L.1
Nagarajan, R.2
Volpe, L.3
Wong, J.S.4
Melroy, O.5
-
7
-
-
0035241958
-
Effect of Particulate Concentration, Materials and Size on the Friction and Wear of a Negative-Pressure Picoslider Flying on a Laser-Textured Disk
-
-
Yoon, E-S. and B. Bhushan. 2001. Effect of Particulate Concentration, Materials and Size on the Friction and Wear of a Negative-Pressure Picoslider Flying on a Laser-Textured Disk. Wear 247: 180-190.
-
(2001)
Wear
, vol.247
, pp. 180-190
-
-
Yoon, E.-S.1
Bhushan, B.2
-
8
-
-
0347541835
-
Survey of Cleaning and Cleanliness Measurement in Disk Drive Manufacture
-
. Feb. 13-22
-
Nagarajan, R. 1997. Survey of Cleaning and Cleanliness Measurement in Disk Drive Manufacture. Precision Cleaning Journal. Feb. 13-22.
-
(1997)
Precision Cleaning Journal
-
-
Nagarajan, R.1
-
9
-
-
0030232614
-
Particle Removal from Semiconductor Surfaces by Megasonic Cleaning
-
-
Kuehn, T. H., D. B. Kittelson, Y. Wu, and R. Gouk. 1996. Particle Removal from Semiconductor Surfaces by Megasonic Cleaning. Journal of Aerosol Science 27, Supplement 1: S427-28.
-
(1996)
Journal of Aerosol Science
, vol.27
, Issue.SUPPL.EMENT 1
-
-
Kuehn, T.H.1
Kittelson, D.B.2
Wu, Y.3
Gouk, R.4
-
10
-
-
0005256344
-
Particle Adhesion to Surfaces: Theory of Cleaning
-
, ed. R. P. Donovan, New York: Marcel Dekker, Inc
-
Menon, V.B. 1990. Particle Adhesion to Surfaces: Theory of Cleaning. In Particle Control for Semiconductor Manufacturing, ed. R. P. Donovan, 359-82. New York: Marcel Dekker, Inc.
-
(1990)
Particle Control for Semiconductor Manufacturing
, pp. 359-382
-
-
Menon, V.B.1
-
11
-
-
0038347222
-
Cavity Cluster Approach for Quantification of Cavitational Intensity in Sonochemical Reactors
-
-
Kanthale, P. M., P. R. Gogate, A. B. Pandit, and A. M. Wilhelm. 2003. Cavity Cluster Approach for Quantification of Cavitational Intensity in Sonochemical Reactors. Ultrasonics Sonochemistry. 10 (4-5): 181-89.
-
(2003)
Ultrasonics Sonochemistry
, vol.10
, Issue.4-5
, pp. 181-189
-
-
Kanthale, P.M.1
Gogate, P.R.2
Pandit, A.B.3
Wilhelm, A.M.4
-
12
-
-
1842735471
-
Sonochemical Reactors: Scale-Up Aspects
-
-
Gogate, P. R. and A. B. Pandit. 2004. Sonochemical Reactors: Scale-Up Aspects. Ultrasonics Sonochemistry 11 (3-4): 105-17.
-
(2004)
Ultrasonics Sonochemistry
, vol.11
, Issue.3-4
, pp. 105-117
-
-
Gogate, P.R.1
Pandit, A.B.2
-
14
-
-
0036846996
-
Surface Acoustic Cavitation Understood Via Nanosecond Electrochemistry. Part III: Shear Stress in Ultrasonic Cleaning
-
-
Maisonhaute, E., C. Prado, P. C. White, and R. G. Compton. 2002. Surface Acoustic Cavitation Understood Via Nanosecond Electrochemistry. Part III: Shear Stress in Ultrasonic Cleaning. Ultrasonics Sonochemistry 9: 297-303.
-
(2002)
Ultrasonics Sonochemistry
, vol.9
, pp. 297-303
-
-
Maisonhaute, E.1
Prado, C.2
White, P.C.3
Compton, R.G.4
-
15
-
-
0032882267
-
Relations Between Cavitation Erosion Resistance of Materials and Their Fatigue Strength Under Random Loading
-
-
Bedkowski, W., G. Gasiak, C. Lachowicz, A. Lichtarowicz, T. Lagoda, and E. Macha. 1999. Relations Between Cavitation Erosion Resistance of Materials and Their Fatigue Strength Under Random Loading. Wear 230: 201-9.
-
(1999)
Wear
, vol.230
, pp. 201-209
-
-
Bedkowski, W.1
Gasiak, G.2
Lachowicz, C.3
Lichtarowicz, A.4
Lagoda, T.5
Macha, E.6
-
16
-
-
2942532640
-
Relations of the Characteristic Temperatures and Fragility Parameters in Glass-Forming Metallic System
-
, June
-
Zhao, Y., X. Bian, K. Yin, J. Zhou, J. Zhang, and X. Hou. 2004. Relations of the Characteristic Temperatures and Fragility Parameters in Glass-Forming Metallic System. Physica B: Condensed Matter 349 (June): 327-32.
-
(2004)
Physica B: Condensed Matter
, vol.349
, pp. 327-332
-
-
Zhao, Y.1
Bian, X.2
Yin, K.3
Zhou, J.4
Zhang, J.5
Hou, X.6
-
17
-
-
85012738841
-
Acoustic Streaming
-
, ed. W. P. Mason, New York: Academic Press
-
Nyborg, W. L. 1965. Acoustic Streaming. In Physical Acoustics II, ed. W. P. Mason, 265-331. New York: Academic Press.
-
(1965)
Physical Acoustics II
, pp. 265-331
-
-
Nyborg, W.L.1
-
18
-
-
0038935815
-
Second Order Acoustic Field: Streaming and Viscosity and Relaxation
-
-
Markham, J. J. 1952. Second Order Acoustic Field: Streaming and Viscosity and Relaxation. Physical Review 86: 497-502.
-
(1952)
Physical Review
, vol.86
, pp. 497-502
-
-
Markham, J.J.1
-
19
-
-
0030785748
-
Acoustic Streaming: Comparison of Low-Amplitude Linear Model with Streaming Velocities Measured by 32-MHz Doppler
-
-
Nowicki, A., W. Secomski, and J. Wojcik. 1997. Acoustic Streaming: Comparison of Low-Amplitude Linear Model with Streaming Velocities Measured by 32-MHz Doppler. Ultrasound in Medicine and Biology 23 (5): 783-91.
-
(1997)
Ultrasound in Medicine and Biology
, vol.23
, Issue.5
, pp. 783-791
-
-
Nowicki, A.1
Secomski, W.2
Wojcik, J.3
-
20
-
-
2942710176
-
On Some Non-Linear Effects in Sound Fields, with Special Emphasis on the Generation of Vorticity and the Formation of Streaming Patterns
-
-
Tjotta, S. 1959. On Some Non-Linear Effects in Sound Fields, with Special Emphasis on the Generation of Vorticity and the Formation of Streaming Patterns. Arch. Math. Naturvidensk 55: 1-68.
-
(1959)
Arch. Math. Naturvidensk
, vol.55
, pp. 1-68
-
-
Tjotta, S.1
-
22
-
-
33751420758
-
Optimization of Ultrasonic Cleaning for Erosion-Sensitive Microelectronic Components
-
-
Nagarajan, R., M. Diwan, P. Awasthi, A. Shukla, P. Sharma, M. Goodson, and S. Awad. 2006. Optimization of Ultrasonic Cleaning for Erosion-Sensitive Microelectronic Components. Proceedings of the 17th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) 233-7.
-
(2006)
Proceedings of the 17th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
, pp. 233-237
-
-
Nagarajan, R.1
Diwan, M.2
Awasthi, P.3
Shukla, A.4
Sharma, P.5
Goodson, M.6
Awad, S.7
|